µc-Si: H n-type doped layers resistant against HWCVD i-layers deposited at high temperature and high growth rate

A. Gordijn, J. Francke, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journalMeeting AbstractOther research output

Original languageUndefined/Unknown
Pages (from-to)338-340
Number of pages3
JournalThin Solid Films
Volume501
Issue number(1-2)
Publication statusPublished - 2006

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