Thin film silicon deposited at 100°C by VHF PECVD: optoelectronic properties and its incorporation in solar cells

  • Ruud Schropp (Invited speaker)

Activity: Talk or presentation › Invited talk › Academic

Period26 Aug 2009
Event title23rd International Conference on Amorphous and Nanocrystalline Semiconductors
Event typeOther
LocationUtrecht, NetherlandsShow on map