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Hot-wire CVD deposited nc-Si:H at a deposition rate higher than 1.2 nm/s

  • Ruud Schropp (Invited speaker)

Activity: Talk or presentation › Invited talk › Academic

Period25 Aug 2009
Event title23rd International Conference on Amorphous and Nanocrystalline Semiconductors
Event typeOther
LocationUtrecht, NetherlandsShow on map